AA-DEFLECTORS & VARIABLE FREQUENCY SHIFTERS
AA-DEFLECTORS & VARIABLE FREQUENCY SHIFTERS
- 产品详情
- 产品参数
A Bragg configuration gives a single first order output beam, which intensity is directly linked to the power of RF control signal, and which angle is directly linked to the RF frequency.
By varying the frequency, the output laser beam angle is modified. A deflector is used to scan a laser beam over a range of angles, or to control with accuracy the output angle of the laser beam. By varying the frequency, the first order beam is also frequency shifted by the amount of the RF carrier frequency: it acts like a variable frequency shifter.
The main parameters to qualify a deflector are 1. Deflection angle range and 2. Resolution. The deflection angle range is the maximum angle variation of the laser beam: it is linked to the frequency range of the device. The resolution of a deflector is the number of distinct directions which can be ad- dressed by the deflector: it is linked to the deflection angle range and laser divergence.
Two deflectors can be used in serie and at right angles to give full two-dimensional scanning.
By varying the frequency, the output laser beam angle is modified. A deflector is used to scan a laser beam over a range of angles, or to control with accuracy the output angle of the laser beam. By varying the frequency, the first order beam is also frequency shifted by the amount of the RF carrier frequency: it acts like a variable frequency shifter.
The main parameters to qualify a deflector are 1. Deflection angle range and 2. Resolution. The deflection angle range is the maximum angle variation of the laser beam: it is linked to the frequency range of the device. The resolution of a deflector is the number of distinct directions which can be ad- dressed by the deflector: it is linked to the deflection angle range and laser divergence.
Two deflectors can be used in serie and at right angles to give full two-dimensional scanning.
HIGH RESOLUTION
| Model | Material | Wavelength nm | Aperture mmxmm | Freq (Shift) MHz | Polarisation | Resolution T.DF | Deflexion angle range | Efficiency % |
| DTSX-250 | TeO2 | 375-1600* | 4,5 x 4,5 | f(λ) | Linear | 300@633nm | 48@633nm | > 70 |
| DTSX-400 | TeO2 | 375-1600* | 7,5 x 7,5 | f(λ) | Linear | 500@633nm | 48@633nm | > 70 |
| DTSXY-250 | 2 Axis TeO2 | 375-1600* | 4,5 x 4,5 | f(λ) | Linear | 300x300@633nm | 41 x 41@532nm | > 45 |
| DTSXY-400 | 2 Axis TeO2 | 375-1600* | 7,5 x 7,5 | f(λ) | Linear | 500x500@633nm | 41 x 41@532nm | > 45 |
| DT230-B120A0,5-UV | TeO2 | 400-450 | 0,5 x 17,5 | 230+/-60 | Linear | 500 | 11,4@400nm | > 50 |
| DT230-B120A0,5-VIS | TeO2 | 450-670 | 0,5 x 17,5 | 230+/-60 | Linear | 500 | 15@532nm | > 50 |
LOW RESOLUTION
| Model | Material | Wavelength (nm) | Aperture mm² | Frequency shift (MHz) | Polarisation | Resolution TΔF | Deflexion angle (mrd) | Diffraction Efficiency (%)* |
| MQ200-B30A1.5-244.266-Br | Fused Silica | 244-266 | 1.5 x 2 | 200+/-15 | Linear | 5 | 1,3@266nm | > 60 |
| MQ110-B30A1-UV | Fused Silica | 325-425 | 1 x 2 | 110+/-15 | Linear | 10 | 1.8@355nm | > 60 |
| MT200-B50A0,5-400.442 | TeO2 | 400-442 | 0,5 x 2 | 200+/-25 | Linear/random | 23 | 5,4 @458nm | > 80 |
| MT200-B100A0,5-VIS | TeO2 | 450-700 | 0,5 x 2 | 200+/-50 | Linear/random | 47 | 12,6@532nm | > 70@633nm |
| MT110-B50A1-VIS | TeO2 | 450-700 | 1 x 2 | 110+/-25 | Linear/random | 23 | 6,3@532nm | > 65@633nm |
| MT110-B50A1,5-VIS | TeO2 | 450-700 | 1,5 x 2 | 110+/-25 | Linear/random | 23 | 6,3@532nm | > 65@633nm |
| MT80-B30A1-VIS | TeO2 | 450-700 | 1 x 2 | 80+/-15 | Linear/random | 14 | 3,8@532nm | > 65 |
| MT80-B30A1,5-VIS | TeO2 | 450-700 | 1,5 x 2 | 80+/-15 | Linear/random | 14 | 3,8@532nm | >65 |
| MT200-B100A0,5-800 | TeO2 | 750-950 | 0,5 x 2 | 200+/-50 | Linear/random | 47 | 18,6 @785nm | > 60 |
| MT200-B40A1-800 | TeO2 | 750-950 | 1 x 2 | 200+/-20 | Linear/random | 19 | 7,4 @800nm | > 70@785nm |
| MT350-B120A0,12-800 | TeO2 | 750-950 | 0,2 x 1 | 350+/-60 | Linear/random | 28 | 22,8@800nm | > 60 |
| MT250-B100A0,5-800 | TeO2 | 750-950 | 0,5 x 2 | 250+/-50 | Linear/random | 47 | 19@800nm | > 60 |
| MT200-B100A0,5-800 | TeO2 | 750-950 | 0,5 x 2 | 200+/-50 | Linear/random | 47 | 19@800nm | > 60@785nm |
| MT110-B50A1-IR | TeO2 | 700-1100 | 1 x 2 | 110+/-25 | Linear/random | 23 | 9,5@800nm | > 60@785nm |
| MT110-B50A1,5-IR | TeO2 | 700-1100 | 1,5 x 2 | 110+/-25 | Linear/random | 23 | 9,5@800nm | > 60@785nm |
| MT80-B30A1-IR | TeO2 | 700-1100 | 1 x 2 | 80+/-15 | Linear/random | 14 | 5,7@800nm | > 70@785nm |
| MT80-B30A1,5-IR | TeO2 | 700-1100 | 1,5 x 2 | 80+/-15 | Linear/random | 14 | 5,7@800nm | > 70@765nm |
| MT200-B100A0,5-1064 | TeO2 | 980-1100 | 0,4 x 2 | 200+/-50 | Linear/random | 47 | 25,3@1064nm | > 35 |
| MT200-B100A0,2-1064 | TeO2 | 980-1100 | 0,2 x 1 | 200+/-50 | Linear/random | 47 | 25,3@1064nm | > 60 |
| MT110-B50A1-1064 | TeO2 | 980-1100 | 1 x 2 | 110+/-25 | Linear/random | 23 | 12,6@1064nm | > 55 |
| MT110-B30A1,5-1064 | TeO2 | 960-1100 | 1,5 x 2 | 110+/-15 | Linear/random | 14 | 7,6@1064nm | > 60 |
| MT80-B30A1-1064 | TeO2 | 980-1100 | 1 x 2 | 80+/-15 | Linear/random | 14 | 7,6@1064nm | > 60 |
| MT80-B30A1,5-1064 | TeO2 | 980-1100 | 1,5 x 2 | 80+/-15 | Linear/random | 14 | 7,6@1064nm | > 60 |
* Diffraction efficiency is wavelength dependent
